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Vacuum Furnace System
Single Wafer Processing / Wet Station
Wafer Cleaning Customized According to Customer Requirements
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Spin Coater
| Subtrate Diameter: | 10 to 125 mm | ![]() |
| Spread Process Time: | 0.01 to 99.99s (adjustable) | |
| Spread Speed Range: | 500 to 3000RPM (adjustable) | |
| Spin Process Time: | 0.01 to 99.99 (adjustable) | |
| Spin Speed Range: | 1500 to 8000RPM (adjustable) | |
| Maximum Rotation Speed: | 8000RPM | |
| Power: | 220V, 0.5A, 50Hz | |
| Vacuum: | 24 in Hg | |
| Size (Length x Width x Height) : | 230 x 270 x 260 mm | |
| Weight: | 8kg |
For more infomation: Contact Us

Wafer Cleaning

