MOS-2A Mask Aligner |
|
| Mask Size: |
a. 100 x 100 x 2 ~ 3 mm |
 |
| |
b. 75 x 75 x 2 ~ 3 mm |
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c. 65 x 65 x 2 ~ 3 mm |
| Substrate Size: |
35 ~ 75 mm OD |
| Exposure Resolution: |
2 µm |
| Mask and Substrate Move Range: |
X,Y≥±2.5mm;
q(Rotating)
≥±6º
|
| Stage Move Range: |
X Add Y±75mm |
| Exposure Energy System: |
GCQ200W Lamp; Wavelength:300-436nm |
| Exposure Energy: |
>7 mV/cm²; Wavelength: 407 nm |
| Exposure Uniformity: |
>±5%( Within D:75m diameter area) |
| Lighting Wavelength: |
>545nm |
| Exposure Time: |
>0.1 to 99Mmin |
| Zoom: |
13mm |
| Magnification: |
a. Paired eyepiece 10X,16X |
| |
b. Objective 6X,9X,15X |
| |
c. Total Mgnification:60X TO 240X |
| Vacuum Contact Pressure: |
≥0.7kgf |
| Dimension: |
1000 x 850 x 980mm (2pcs) |
| Weight: |
200kg |
|
|
|
MOS-2B Double Side Mask Aligner |
|
| Mask Size: |
a. 100 x 100 x 2 ~ 3 mm |
 |
| |
b. 75 x 75 x 2 ~ 3 mm |
| Substrate Size: |
a. 50 mm OD |
| |
b. 75 mm OD |
| Exposure Resolution: |
3µm |
| Mask and Substrate Move Range: |
X,Y≥±2.5 mm;
q(Rotating)
≥±5º |
| Stage Move Range: |
X±37.5 mm,Y±20 mm |
| Exposure Energy System: |
GCQ200W High Pressure Hg Lamp, |
| |
Wavelength: 300 to 436nm |
| Exposure Intensity: |
≥7mW/cm² (Wavelength 407nm) |
| Exposure Uniformity: |
±5% (Within 75mm diameter area ) |
| Microscope Illumination Wavelength: |
545nm |
| Exposure Time: |
0.01 to 99.99 min |
| Zoom: |
13mm |
| Magnification: |
a. Paired eyepiece 10X,16X |
| |
b. Objectitive.6X, 9X |
| |
c. Total Mgnification:60X to 144X |
| Vacuum Contact Pressure: |
≥0.7kgf |
| Power Supply: |
a.Frequency:50Hz |
| |
b. Rated voltage 190V to 230V |
|
c. Power consumption:≤300VA
(800 X 1440 X 650 mm) |
|
| Dimensions: |
800 X 1440 X 650 mm |
| Weight: |
80kg |
|
|
|
MOS-3 High Precision Mask Aligner |
|
| Mask Size: |
a. 150 x 150 x 2.3 mm |
 |
| |
b. 125 x 125 x 2.3 mm |
|
c. 100 x 100 x 2.3 mm |
| Substrate Size: |
a. 125 mm OD |
| |
b. 100 mm OD |
| Exposure Resolution: |
2µm |
| Mask and Substrate Move Range: |
X,Y≥±5 mm;
q(Rotating)
≥±5º |
| Adjusted Range: |
0 ~ 1mm |
| Exposure Energy System: |
CQ200W High Pressure Hg Lamp, Wavelength:300 to
436nm |
| |
| Exposure Intensity: |
18mW/cm² |
| Exposure Uniformity: |
±3% (Within D:110m diameter area) |
| Lighting Wavelength: |
45nm |
| Exposure Time: |
0 to 99.99min |
| Zoom: |
13mm |
| Magnification: |
a. Paired eyepiece 10X,15X |
| |
b. Objective 10X, 16X |
| |
c. Total Mgnification:40X to 240X |
| Vacuum Contact pressure: |
≥-0.06Mpa |
| Power Supply: |
AC220V±10% 50Hz |
| Environmental Temperature: |
22±2 ºC |
| Relative Humidity: |
≤60% |
| Dimension: |
960(W)X1000(D)X1400(H) mm |
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